Material: Superior CTP specialized substrate, good planeness, unique electric-chemical grain, anodic oxidization and hydrophilic processed substrate.
Stability: Advanced automatic production equipments, strictly quality supervised to guarantee the plate consistency from lot to lot.
Compatibility: Compatible to most of the common CTP machines, processors and developer.
Cost performance: Fast exposure, excellent ink- water balance, high ink efficiency, and good chemical resistant.
Convenience: Day light process, pre-heated free.
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MODEL
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CXK-P8 Positive Thermal CTP plate
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PARAMETER
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Spectra Sensitivity
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830nm
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Laser Power
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110mj/c㎡-140mj/c㎡
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Resolution
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1-99% 200lpi/10μFM
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UV Compatibility
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Compatible after baked
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Baking Condition
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230-250℃，8-12Minutes (Applied with plate baking solution)
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Thickness
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0.15mm - 0.40mm
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Max Width
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1200mm
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Storage
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Store where it is cool and dry, temperature 5-30℃,RH≤60%
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Shelf Life
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18months
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DEVELOPING
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Developer/Replenisher
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CXK-P8-DVP
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Developing Temperature
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24℃±2℃
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Process Speed
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20S±5S
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Replenish Rate
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Dynamic 100ml/㎡ Static 40-80ml/h
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Brush Speed
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90-110rpm
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Chemical Replacement
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2500-3000㎡ (Not exceed 8 weeks)
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CAUTION
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Plate Gum
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Suggest to use good quality gum
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Scratch Caution
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Handle with care
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Slight Adjustment
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In case slight adjustment needed, it is suggest to extend the developing time rather than to increase developer temperature.
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